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December 4, 2007

Trio to collaborate on e-beam tech for sub-10nm devices

Filed under: media independent — admin @ 10:14 pm

June 4, 2007 - GenISys GmbH, JEOL Ltd., and philanthropist U. are partnering to amend modern technologies for direct-write e-beam accumulation activity and lepton impact rebuke technologies for nanometer-range structures.

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