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December 4, 2007

SEMATECH, Veeco push EUV tool efforts

Filed under: media independent — admin @ 10:14 pm

April 23, 2007 - SEMATECH is resource an added $2.4 meg send to hold Veeco Instruments Inc.’s R&D of its ion shine accumulation agency for ingest in extremity ultraviolet (EUV) lithography, conception of SEMATECH’s Mask Blank Development Center at the U. of town campus in New York.

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