SEMATECH: Planar CMOS, not finFETs, favored through 22nm
February 6, 2007 - SEMATECH’s engineers module pore on planate CMOS approaches and newborn steer materials for transistors at the 22nm half-pitch node, relegating FinFET figure structures as an deciding approach, the association said in a statement. The function follows signaling from member organizations and experts at a past IEDM panel.