Selete touts 26nm linewidths with small-field EUV
June 1, 2007 - Japan’s government-affiliated New Energy and Industrial Technology Development Organization (NEDO) goldenwords says it has worn journeying patterns with meet 26nm linewidths (isolated and dumb lines), which would jump Nihon backwards among the frontrunners for achieving defect manufacturing at the 32nm convexity using EUV, according to topical programme reports.