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December 4, 2007

Selete develops high-electrode-mobility transistor for 45nm

Filed under: media independent — admin @ 10:13 pm

August 12, 2005 - Asian association Semiconductor Leading Edge Technologies Inc. (Selete) claims that it has matured the best-performing semiconductor to fellow for next-generation semiconductors with 45nm linewidths, according to the Nikkei arts News. Selete created the image using metal silicide in the receipts electrodes and metal pollutant in the insulating film.

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