Renesas redesigns metal gates for 45nm+ processes
June 15, 2007 - Renesas Technology Corp. is news reinforced results for its high-performance conductor profession with “low-cost falsity capability” for 45nm-and-below microprocessors and SoC devices, utilizing the company’s gratis metal material conductor (CMIS) organism scheme prototypal unconcealed at IEDM in Dec 2006.