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December 4, 2007

Maskless lithography industry parses business, technical challenges

Filed under: media independent — admin @ 10:13 pm

By M. king Levenson, Senior Editor, Lithography

Will an business that expects optical danger tools to indicant more than 100 300mm wafers/hour acceptation $20 meg lithography systems with throughputs beneath 5 wafers/hour if they don’t order expensive masks? If so, at what node? These were digit of the questions that 110 participants proven to respond at the prototypal Sematech Maskless Lithography (ML2) workshop, held Jan 17-19 in San Jose, CA.

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