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December 4, 2007

DuPont, IMEC working on post-CMP, Cu/low-k beyond 45nm

Filed under: media independent — admin @ 10:14 pm

July 17, 2007 - DuPont Electronic Technologies has connected dweller defect R&D association IMEC as an industrialized affiliate in 45nm and 32nm profession development, involved in programs on cleaning, dirtying control, and modern interconnects.

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