Carl Zeiss announces new 248nm litho system for 80nm resolution
July 18, 2007 - Carl Zeiss SMT AG declared at SEMICON West today its newborn optical lithography grouping for KrF, the Starlith 1000, with a nonverbal aperture (NA) of 0.93, which module reportedly be the maximal NA for 248nm danger wavelength acquirable in the market.