AMAT releases oxide spacer system at SEMICON West
July 18, 2007 - Applied Materials Inc. today free its Applied Producer ACE SACVD system, which helps modify 193nm lithography using self-aligned threefold patterning (SADP) schemes. The ACE grouping reportedly delivers a highly conformal pollutant spacer flick with greater than 95% travel coverage, <5% ornament weight and <1% nonuniformity for grave magnitude control.